Physical Vapor Deposition (organic)
Technical Data | Physical Vapor Deposition (organic) |
| Company: | CreaPhys |
| Application: | Custom thin film deposition for organic electronics (e.g. OLEDs, organic solar cells, etc.) |
| Process type: | Automated processing |
| Material: | Equipped for deposition of organics and/or metals |
| Substrate sizes: | Max. 150 x 150 mm and 16 x 25.6 x 25.6 mm, Thickness 0.5 – 1.1 mm, glass and foils |
| Base pressure: | HV (< 10-6 mbar) |
| Substrate temperature range: | RT – 500°C |
| Sources: | Min. 12 deposition sources (min. 8x organic sources) |
| Plasma option: | RF-Generator (13.56 MHz) variable adjustable up to mind. 300W |
| Control system: | PLC control with PC user interface |
| Integration: | Glove box Load-Lock |